Surface patterns were created directly onto a commercial polyethersulfone ultrafiltration membrane using nanoimprint lithography, which resulted in a moderately reduced molecular mass cut-off (MWCO) but similar permeance as its non-imprinted counterpart as well as significantly improved resistance to BSA fouling. Staged filtration experiments, with backwash cleaning, revealed that the permeate flux of the imprinted membrane was considerably higher than that of the non-imprinted membrane, consistent with UV–vis measurements showing less protein deposition on the imprinted membranes.